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(Ebook) Interlayer Dielectrics for Semiconductor Technologies by S.P. Murarka, M. Eizenberg and A.K. Sinha (Eds.) ISBN 9780125112215, 0125112211

  • SKU: EBN-4341594
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Authors:S.P. Murarka, M. Eizenberg and A.K. Sinha (Eds.)
Pages:442 pages.
Year:2003
Publisher:Elsevier/Academic Press
Language:english
File Size:8.1 MB
Format:pdf
ISBNS:9780125112215, 0125112211
Categories: Ebooks

Product desciption

(Ebook) Interlayer Dielectrics for Semiconductor Technologies by S.P. Murarka, M. Eizenberg and A.K. Sinha (Eds.) ISBN 9780125112215, 0125112211

Content: Preface, Pages v-vii, S.P. Murarka, M. Eizenberg, A.K. SinhaAcknowledgements, Page ixList of Contributors, Pages xi-xiiChapter 1 - Introduction: Interlayer dielectrics in microelectronic devices, Pages 1-6, M. EizenbergChapter 2 - Dielectric properties, Pages 7-36, S.P. MurarkaChapter 3 - Characterization of low dielectric constant materials, Pages 37-76, P.S. Ho, J. Liu, M. Morgen, M. Kiene, J.-H. Zhao, C. HuChapter 4 - Compatibilities of dielectric films, Pages 77-119, C.K. Goldberg, V.S. WangChapter 5 - Silicon-based dielectrics, Pages 121-156, C. Leung, E. OngChapter 6 - Low-κ polymers, Pages 157-199, S.P. MurarkaChapter 7 - Chemical vapor deposition of C-F low-k materials, Pages 201-225, M. Uhlig, T. GessnerChapter 8 - Spin-on Si-based low-k materials, Pages 227-259, S.E. Schulz, T. GessnerChapter 9 - Nanoporous dielectric films: Fundamental property relations and microelectronics applications, Pages 261-325, J.L. Plawsky, W.N. Gill, A. Jain, S. RogojevicChapter 10 - High-k dielectrics grown by atomic layer deposition: Capacitor and gate applications, Pages 327-348, M.D. Groner, S.M. GeorgeChapter 11 - Dielectric materials in optical waveguide aplications, Pages 349-389, P.D. Persans, F. Huang, N. Agarwal, S. Ponoth, J.L. PlawskyChapter 12 - Reliability, Pages 391-407, S.P. MurarkaChapter 13 - Future trends in silicon technologies, Pages 409-427, E. Ong, A. SinhaIndex, Pages 429-444
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